Simple, repeatable, and accurate resistivity and sheet resistance measurements
Spatial resolution and accuracy of resistivity and sheet resistance measurements are governed by the probe tip spacing. The various nano-to-micro spacings of the four point probes allows for repeatable, accurate, higher spatial resolution and higher measurement throughput sheet resistance and resistivity measurements of semiconductor and thin film materials. These probes are ideal for single spot and multi-spot mapping of resistivity and sheet resistance of thin film materials and semiconductor structures.
|Probe Width||400 nm||400 nm|
|Probe Spacing||400 nm||800 nm|
|Tip Spacing||700 nm|
|Tip Length||1.5 um|
|Electrical Leakage||1pA @2V||1pA @2V||1pA @2V|